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Radiation Handbook for Electronics Texas Instruments
the other two mechanisms (the terrestrial thermal neutron flux and
the alpha particles), the
10
B(n,a)
7
Li mechanism can cause reliability
issues in microelectronics that have BPSG layers close to the silicon
substrate, or those that use borane-based fabrication processes
and leave
10
B residue near the active silicon.
It’s possible to mitigate SEEs caused by the activation of
10
B
in BPSG in several ways. The first and most direct is simply to
eliminate BPSG, borane or other boron-containing compounds
from the process flow. Due to the limited range of the alpha and
lithium recoil emitted during the
10
B(n,a)
7
Li reaction, there is no
need to replace or modify concentrations of
10
B outside this range
because the secondary products will never reach active silicon. In
cases where the unique reflow and gettering properties of boron
are needed, or the boron compound is required in the process, the
boron source material should be replaced with one enriched with
a
11
B, thereby mitigating
10
B without changing the desired physical
or chemical properties and without requiring new equipment or
processing steps.
Finally, if the process cannot be changed, such as in the case
of a foundry process, the packaging materials can use materials
rich in
10
B to provide a thermal neutron shield. For example, in a
plastic molded package, the silica filler could be doped with
10
B,
thus providing effective shielding for thermal neutrons. Because
the resultant secondary alpha-particle and lithium recoils only have
a range of <2 μm, they would be completely absorbed by the
silica and mold compound or die materials long before any of the
radiation would reach the sensitive active silicon device volume.
1.3 Artificial radiation environments
This section focuses on man-made artificial radiation environments,
situations where microelectronics are exposed to – and must function
in – radiation environments produced in a host of medical, industrial
and defense applications. In medical applications, the radiation
exposure occurs most often in diagnostic or treatment equipment
such as X-ray and proton-beam therapy machines. High doses of
electron-beam (e-beam) or gamma-ray irradiation are also used
for sterilizing surgical instruments and implantable electronics in
operating rooms.
There are numerous industrial uses of radiation. A wide range of
applications rely on X-ray, gamma- and e-beam irradiation, from
waste treatment to inspection to security screening. Microelectronics
are exposed to doses of neutrons and gamma rays when used in
high-radiation areas inside nuclear power plants. In the defense
environment, electronics must be hardened against brief but intense
gamma-ray and neutron exposures, as well as against follow-on
electromagnetic pulse (EMP) effects from nuclear detonations. For
microelectronics in most medical and industrial applications, TID is the
primary radiation effect concern, while in the defense environment,
the concern includes the full spectrum of SEEs, TID, DDD and
prompt-dose (high-dose-rate) effects.
Medical radiation environments
In the medical field, devices that produce X-rays are ubiquitous, from
simple dental X-ray machines to full-body scanners (dental X-rays,
fluoroscopes, computerized axial tomography [CAT] scanners, etc.).
Figure 1-21 shows an evacuated tube with electrodes at each end
producing X-rays. One electrode, the filament, is heated by running
a high current through the wire filament. The filament current is the
source of electrons for the acceleration process that produces the
X-rays. The heated wire emits electrons from the surface of the wire,
which is excited by thermionic emission.
In this process, the electrons gain enough kinetic energy from heating
to be able to overcome the work function of the material, which is
the energy required to liberate an electron from inside a material. The
filament itself is surrounded by a grounded metal cup with an aperture
at the end, facing the other electrode. The other electrode, the target,
is biased with a high positive voltage with respect to the filament cup
(usually 10-150 KeV) such that the high electric field immediately
sweeps the electrons emitted through the aperture in the cup toward
the target electrode. Because the electrons are traveling in a vacuum,
they suffer no energy-robbing collisions with gas molecules and thus
are accelerated to high energies by the field.
When these energetic electrons collide with the target (usually a
high-z metal such as tungsten), various scattering effects (see
Chapter 2) produce X-rays. The target is usually canted at an angle
to enable the X-ray radiation to radiate out of the side of the tube,
unobstructed. The amount of radiation exposure in diagnostic
applications near the equipment or in the patient is not high enough
to pose a risk to microelectronics because the X-ray dose is tightly
controlled (humans are much more sensitive to radiation exposure
than electronics), and the X-ray equipment is heavily shielded so that
no X-rays radiate outside the target treatment area.
As an example of a typical patient dose, consider the very popular
computer tomography (CT) or CAT scanner, which provides cross-
sectional images of the body constructed from a series of multiple
X-ray exposures from different radial positions, as illustrated in
Figure 1-22.
[45]
This type of diagnostic will usually give a maximum
X-ray dose, as a large number of X-ray exposures is required to build
up the image.
Figure 1-21. Cross-sectional diagram of an X-ray tube.
Filament
current
Vacuum
X-rays
Tungsten
target
High-voltage
anode
Glass envelope
Filament
Grounded Cathode
shield
+V
Accelerated
electrons