PARMS沉积金属氧化物薄膜的特性研究
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"Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering" 是一篇关于使用等离子体辅助反应磁控溅射（PARMS）技术沉积的金属氧化物薄膜的特性研究的文章。该研究关注的是SiO2、Nb2O5和Ta2O5单层薄膜的基本光学和机械性质。
文章详细讨论了以下几个关键知识点：
1. 光学指数（Optical Index）：这是衡量材料对光波吸收、散射和折射能力的重要参数。高折射率表明这些金属氧化物薄膜对光有较强的交互作用，这在光学涂层的设计中至关重要，因为它们可以控制光的反射、透射和吸收。
2. 内在薄膜应力（Intrinsic Film Stress）：薄膜内部的应力对其稳定性和性能有直接影响。中等的压应力表明薄膜在应用中可能具有良好的机械稳定性，不会因应力释放而产生裂纹或变形。
3. 光谱透过率热移（Thermal Shift of Spectral Transmittance）：这是一个评估材料在温度变化下其光学性能是否稳定的重要指标。近乎零的热移意味着这些薄膜在温度变化时能保持其光学特性，这对于需要在宽温范围工作的光学器件尤其重要。
4. 微粗糙度（Microroughness）：低微粗糙度意味着薄膜表面平滑，这对减少光散射和提高光学性能是必要的。平滑的表面也有助于提高薄膜与基底的粘附力，降低界面反射。
5. 等离子体辅助反应磁控溅射（Plasma-Assisted Reactive Magnetron Sputtering, PARMS）：这是一种薄膜沉积技术，通过引入等离子体，可以增加靶材与气体分子的反应，生成所需的化合物薄膜。PARMS的优势在于能够精确控制薄膜的成分和结构，且过程稳定性高，适用于制造高性能光学涂层。
6. 多层膜堆叠的性能（Multilayer Stack Performance）：通过测量包含约200个单层的多层膜的光谱性能，作者展示了PARMS技术在构建复杂光学涂层方面的精度和一致性。这种能力对于实现特定光学功能（如滤光、增透或反射）的多层薄膜设计至关重要。
这些研究成果揭示了PARMS技术在制备高质量光学薄膜方面的潜力，尤其是用于高性能光学涂层的生产。通过优化这些薄膜的特性，可以进一步提升光学设备的性能和稳定性，应用于各种光学器件，如镜头、传感器、激光器和显示器等。
April 30, 2010 / Vol. 8, Supplement / CHINESE OPTICS LETTERS 73
Characterization of metal-oxide thin films deposited by
plasma-assisted reactive magnetron sputtering
Stefan Jakobs
1∗
, Marc Lappschies
1
, Uwe Schallenberg
1
, Olaf Stenzel
2
, and Steffen Wilbrandt
2
1
Mso Jena GmbH, Carl-Zeiss-Promenade 10, 07745 Jena, Germany
2
Fraunhofer IOF, Alb ert-Einstein-Straße 7, 07745 Jena, Germany
∗
E-mail: jakobs@mso-jena.de
Received Octob er 30, 2009
For single layers of SiO
2
, Nb
2
O
5
, and Ta
2
O
5
that are deposited by plasma-assisted reactive magnetron
sputtering (PARMS), we present measurement results for basic optical and mechanical prop erties, in
particular, optical index, intrinsic film stress, thermal shift of spectral transmittance, and microroughness.
We find high refractive indices combined with low intrinsic film roughness, moderate compressive stress, and
almost a vanishing shift, indicate high potential for the production of high-performance optical coatings.
The high thickness accuracy and process stability are exemplified by the measured spectral performance
of multilayer stacks with ab out 200 single layers.
OCIS co des: 310.1860, 310.6860.
doi: 10.3788/COL201008S1.0073.
Plasma-assisted reactive magnetron sputtering (PARMS)
is a new technique for deposition of high-quality optical
coatings. It has been developed to achieve process re-
producibility and film thickness accuracy typical of ion-
beam sputtering. Deposition rates are retained at the
same range as in electron beam evaporation processes.
This study aims to characterize basic material proper-
ties of SiO
2
, Nb
2
O
5
, and Ta
2
O
5
deposited by PARMS,
in particular, optical index in ultraviolet (UV)/visible
(Vis)/near-infrared (NIR) area, intrinsic film stress, ther-
mal shift of spectral transmittance, and microroughness.
Each of these properties may be crucial for the suitability
of a deposition technique for a specific field of applica-
tion. We compare the results for the layers deposited
by PARMS with those deposited by plasma ion-assisted
deposition (PIAD), as well as with results of a recent
study
[1]
on optical and mechanical properties of oxide
optical coating materials deposited by a variety of state-
of-the-art thin-film deposition techniques.
In addition, we present examples of complex optical
coatings deposited by PARMS to demonstrate the poten-
tial of the technique in high-performance applications.
Our investigation was focused on the properties of
metal-oxide films deposited by PARMS (Leybold HE-
LIOS sputter system). SiO
2
, as a low-index material,
and Ta
2
O
5
or Nb
2
O
5
, as high-index materials, were sput-
tered by two dual magnetrons from metal targets. An RF
plasma source was used to assist complete oxidation of
the thin film materials. Substrates were placed onto a
load lock on a horizontally rotating turntable. Optical
monitoring was used for in situ measurement of optical
film thickness and process control. Deposition rates var-
ied in dependence vis-`a-vis particular layer thicknesses.
The average rate for deposition of a multilayer stack was
about 0.4 nm/s or 1.5 µm/h.
For comparison, we deposited single layers of SiO
2
and Ta
2
O
5
by electron beam evaporation with ion as-
sistance (Leybold Advanced Plasma Source)
[2]
. During
film growth on the substrate, the film material was bom-
barded by argon ions with energies of about 120 eV.
Deposition rates were 0.5 and 0.35 nm/s for SiO
2
and
Ta
2
O
5
, respectively.
All layers and layer systems were dep osited at mso jena
onto polished fused silica and BK7 glass substrates at a
diameter of 25 mm and thickness of 3 mm; for stress mea-
surements, onto Si wafer at a diameter of 76.2 mm with
thickness of 0.38 mm.
Spectrophotometry (Perkin Elmer Lambda 900 scan-
ning spectrophotometer) was used to determine optical
constants at Fraunhofer IOF. Transmittance (T ) and re-
flectance (R) were measured at nearly normal incidence
using a self-developed VN attachment, particularly, for
absolute reflectance measurements. From these sp ectra,
optical constants n (refractive index) and k (extinction
coefficient) were deduced from spectra fits in terms of a
Lorentzian multi-oscillator model
[3]
. The accuracy in n-
determination was of the order of 1% relative error. From
the same spectra fits, the thickness of the layers was also
determined.
The thermal shift of the same samples was determined
Table 1. Overview of Samples for Measured
Thickness Determined by Spectrophotometry
Process
Material Type
Target Measured
/Process ID
Thickness Thickness
(nm) (nm)
PARMS
H0058 SiO
2
single layer 370 369.5
H0061 SiO
2
single layer 2000 2019
H0057 Ta
2
O
5
single layer 250 251.7
H0062 Ta
2
O
5
single layer 2000 2012
H0066 Nb
2
O
5
single layer 230 230.2
H0067 Nb
2
O
5
single layer 2000 2002
H0074 SiO
2
/Ta
2
O
5
notch filter 19757
405/488/561/639
H0078 SiO
2
/Nb
2
O
5
band pass 15400
420–480
PIAD
U651 Ta
2
O
5
single layer 2000 1949
U653 SiO
2
single layer 2000 1962
1671-7694/2010/S10073-05
c
° 2010 Chinese Optics Letters
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