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硅 酸 盐 学 报
· 106 ·
2008 年
导模法和温度梯度法生长 r 面蓝宝石
杨新波
1,2
,李红军
1
,徐
军
1
,程
艳
1,2
,周国清
1
(1. 中国科学院上海光学精密机械研究所,上海 201800;2. 中国科学院研究生院,北京 100039)
摘 要:r 面( 0112 )蓝宝石晶体可用作制备非极性 GaN 薄膜的衬底。采用温度梯度法(temperature gradient technique, TGT)和导模法(edge-defined film-fed
crystal growth, EFG)生长了质量良好的 r 面蓝宝石晶体。利用双晶衍射、光学显微镜、光谱仪观察和分析了晶体的结构和缺陷。结果表明:TGT 法生
长的 r 蓝宝石晶体晶片的双晶摇摆曲线对称性好,半高宽值仅为 18
red·s,位错密度为 4
×
10
3
cm
–2
,透过率达 83%,晶体质量好。与 TGT 法相比,EFG
法生长的 r 面蓝宝石晶体的结构完整性较差,位错密度为 5
×
10
5
cm
–2
,透过率仅为 75%。但是 EFG 法具有晶体生长速度快,后期加工成本低的优点。
关键词:温度梯度法;导模法;蓝宝石;位错密度
中图分类号:TQ164 文献标识码:A 文章编号:0454–5648(2008)05–
GROWTH OF r-PLANE SAPPHIRE BY EDGE-DEFINED, FILM-FED GROWTH AND
TEMPERATURE GRADIENT TECHNIQUE
YANG Xinbo
1,2
,LI Hongjun
1
,XU Jun
1
,CHENG Yan
1,2
,ZHOU Guoqing
1
(1. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800;
2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China)
Abstract: (
0112 ) r-plane sapphire is usually used as a substrate for growing nonpolar (1120 ) a-plane GaN film. r-plane sapphires
with good quality were successfully grown by temperature gradient technique (TGT) and edge-defined film-fed crystal growth (EFG)
methods. The properties of the sapphires were measured by double crystal diffractometry, optical microscopy and optical spectrometry.
The results show that the sapphire grown by the TGT method has a dislocation density of 4×10
3
cm
–2
and transmittance of 83%,
and the full width at half maximum of the double crystal rocking curve is only 18
red·s. The crystal is higher quality than the EFG
sapphire. The dislocation density and transmittance of the sapphire grown by the EFG method are 5×10
5
cm
–2
and 75%, respec-
tively. However, sapphires can be grown faster using the EFG method, which decreases the processing cost in the production of
substrate.
Key words: temperature gradient technique; edge-defined film-fed crystal growth; sapphire; dislocation density
Sapphire is widely used for special windows, domes,
substrate and construction material because of its excel-
lent physical and chemical properties, including its high
melting point, exceptional hardness, transmission over a
wide band of wavelengths and radiation and chemical
etching resistance.
[1]
The most common orientation of
sapphire used as substrate in GaN film growth is the
c-plane (0001). The superior crystallographic and elec-
trical quality and smooth surface of film growth on the
c-plane is mostly responsible for its widespread use in
light-emitting diode (LED) applications. However, GaN
film grown on c-plane sapphire has undesirable sponta-
neous and piezoelectric effects, resulting in a large inner
electric field, which decreases the electron-hole recom-
bination efficiency and reshifts the emission lengths, both
of which are undesirable in GaN-based LEDs and laser
diode (LDs).
[2]
Craven et al.
[3]
described the structural
characteristics of nonpolar (
1120 )
a-plane GaN thin films
grown on (
0112 ) r-plane sapphire substrates
via
metal-organic chemical vapor deposition (MOCVD), and
收稿日期:2007–07–16。 修改稿收到日期:2008–10–18。
基金项目:国家 863 项目(2006AA03A104);国家自然科学基金(60607015)
资助项目。
第一作者:杨新波(1982—),男,博士研究生。
通讯作者:徐 军(1965—),男,博士,研究员。
Received date: 2007–07–16. Approved date: 2008–10–18.
First author: YANG Xinbo (1982–), male, postgraduate student for doctor
degree.
E-mail: yangxinbo2000@163.com
Correspondent author: XU Jun (1965–), male, doctor, researcher.
E-mail: xujun@mail.shcnc.ac.cn
第 36 卷第 5 期
2008 年 5 月
硅 酸 盐 学 报
JOURNAL OF THE CHINESE CERAMIC SOCIETY
Vol. 36,No. 5
May, 2008