Terahertz light deflection in doped semiconductor slit arrays
Binzong Xu
n
, Haifeng Hu, Jietao Liu, Xin Wei, Qing Wang, Guofeng Song
n
,YunXu
n
Institute of Semiconductors, Chinese Academy of Sciences, No. A35, QingHua East Road, Haidian District, Beijing 100083, PR China
article info
Article history:
Received 24 December 2012
Received in revised form
29 April 2013
Accepted 19 June 2013
Available online 2 July 2013
Keywords:
Terahertz
Surface plasmon polaritons
Subwavelength slit arrays
Deflector
Doped semiconductor
abstract
We investigate the deflection of the terahertz light through the doped InSb subwavelength slit arrays.
The deflection of light can be tailored by adjusting the doping concentrations of the InSb layers around
the slits through the phase control. We have theoretically analyzed the properties of the InSb-air-InSb
slits based on the plasmonic waveguide theory and the eigenvalue equations. Terahertz light deflectors
with 301,451 and 601 deflection angles are systematically designed. By employing finite-difference time-
domain (FDTD) simulation, the light deflection phenomenon is realized. The theoretically analyzed
results demonstrate very good agreement with the simulated results.
& 2013 Elsevier B.V. All rights reserved.
1. Introduction
Plasmonics has been enormously developed since the discov-
ery of the extraordinary optical properties of surface plasmon
polaritons (SPPs) [1], coherent electron oscillations excited at the
interface between a metal and a dielectric [2]. By altering the
structure of a metal's surface, the properties of surface plasmons
can be tailored and a wide range of applications has appeared,
including polarization sensitive filter [3], lasers [4], sensors [5] and
photovoltaic devices [6–9]. One important plasmonic device is the
plasmonic lens. By employing sub-wavelength metallic slit arrays,
one can control the properties of the output beams through the
slit arrays, such as light collimating, focusing, splitting and
deflecting [10–14]. However, the plasmonic lens technology has a
big challenge when it is intended to be applied in terahertz (THz)
regime for metals cannot support surface plasmons (SPs) in this
region [15]. An emerging approach is to use highly doped
semiconductors to replace metals for THz regime device, because
doped semiconductors have similar dielectric properties at ter-
ahertz frequencies to those of metals in visible region [16].In
addition, the propagation properties of SPs mode in highly doped
semiconductor slits can be tailored by changing the carrier density
through varying the doping concentration, or by photo-excitation
and thermal-excitation of carriers [16–19]. When a light wave
propagates through these slits, it has different phase retardation
[20]. Therefore, the deflection of light can be tuned by adjusting
the material parameters of the slits through the phase control. We
choose Indium antimonide (InSb) as the semiconductor material
for it has a narrow energy gap and large electron density. More-
over, low loss and highly confined terahertz SPs can be supported
on the surface of InSb [17].
In this work, we first analyze the SPs modes in the InSb-
dielectric-InSb slits, and especially focus on the influence of
doping concentration of the semiconductor cladding layers. The
performance of SPs modes in two slits is also clarified by
plasmonic waveguide theory. Finally, we design the light deflec-
tors with slit arrays on a planar InSb film to realize the light
deflection of 301,451 and 601. The deflectors are designed based
on the diffraction theory by phase control of slits with the same
width and different doping concentration. Finite-difference time-
domain (FDTD) method is employed to validate the design of the
plasmonic light deflectors.
2. Permittivity of doped semiconductors
Drude model is used to describe the permittivity of the doped
semiconductor[21]:
εðωÞ¼ε
∞
1−
ω
2
p
ω
2
þ τ
−2
þ i
ω
2
p
τ
−1
ωðω
2
þ τ
−2
Þ
!
ð1Þ
where ε
∞
is the high-frequency permittivity, for InSb ε
∞
¼ 15:7.
τ ¼ μm
n
=e is the average collision time of the charge carriers and
ω
p
¼
ffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffi
e
2
N=ðε
0
m
n
Þ
p
is plasma frequency. The electron density of the
InSb is N, e is the fundamental charge, ε
0
is the vacuum permittiv-
ity, μ is the carrier mobility, and m
n
is the effective mass. As the
electron mobility in the N-type InSb depends on the doping
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Optics Communications
0030-4018/$ - see front matter & 2013 Elsevier B.V. All rights reserved.
http://dx.doi.org/10.1016/j.optcom.2013.06.030
n
Corresponding authors. Tel.: +8610 8230 4164; fax: +8610 8230 4183.
E-mail addresses: bzxu@semi.ac.cn (B. Xu), sgf@red.semi.ac.cn (G. Song),
xuyun@red.semi.ac.cn (Y. Xu).
Optics Communications 308 (2013) 74–77