http://www.paper.edu.cn
-1-
Realization of room temperature electroluminescence from
the heterojunction device with n-ZnO/p-GaN structure
*
Yang Tianpeng
1
,Zhu Huichao
1
,Bian Jiming
2
,Sun Jingchang
2
,Dong Xin
2
,
Zhang Baolin
1
,Liang Hongwei
2
,Li Xiangping
1
,Cui Yongguo
2
,Du Guotong
1, 2
1
State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and
Engineering,Jilin University,Changchun (130012)
2
State Key Laboratory for Materials Modification by Laser,Ion,Electron Beams,School of
Physics and Optoelectronic Technology,Dalian University of Technology,Dalian (116024)
E-mail:jmbian@dlut.edu.cn
Abstract
The heterojunction light-emitting diode with n-ZnO/p-GaN structure was grown on (0001) sapphire
substrate by metalorganic chemical vapor deposition (MOCVD) technique. The heterojunction
structure was consisted of an Mg doped p-type GaN layer with a hole concentration of ~10
17
cm
-3
and a
unintentionally doped n-type ZnO layer with an electron concentration of ~10
18
cm
-3
. A distinct
blue-violet electroluminescence with a dominant emission peak centered at ~415nm was observed at
room temperature from the heterojunction structure under forward bias conditions. The origins of the
EL emissions are discussed in comparison with the photoluminescence spectra, and it was supposed to
be attributed to a radiative recombination in both n-ZnO and p-GaN sides.
Keywords: ZnO thin films; Semiconductors; Metalorganic chemical vapor deposition;
Electroluminescence spectroscopy
1. Introduction
Short-wavelength light emitters have many applications, such as solid-state lighting, display
non-line-of-sight communications,information storage. Recently, ZnO has attracted great interest for
its wide band-gap (3.37 eV) and relatively large exciton binding energy (60 meV) at room temperature
(RT). It has been regarded as one of the most promising candidates for the next generation of
short-wavelength light emitting diodes (LEDs) and lasing devices (LDs) operating at high temperatures
and in harsh environments [1-3]. The ZnO based LEDs will be brighter than the current state-of-art
nitride light emitters, and at the same time, the production cost will be reduced significantly compared
with current technology. ZnO has some fundamental advantages over its major rival (GaN) as a
room-temperature emitter, including a more stable exciton, the availability of large-area substrates, the
amenability to wet chemical etching, and relatively low materials costs. For the application of ZnO
based optoelectronic devices, it is necessary to fabricate both n-type and p-type ZnO films. However,
the realization of stable and reproducible p-type ZnO with acceptable electrical and optical properties
for optoelectronic devices has long been the bottleneck for ZnO-base materials applications [2-3].
Though certain progress has been made in fabricating p-type ZnO and even ZnO based p-n
homojunction light emitting devices, this challenge still represents a major problem since the
light-emitting efficiency was generally very limited due to the poor quality of the p-type ZnO layer
[4-6]. Moreover, the choice of p-type doping materials and growth technique remains controversial [6].
Presently, the properties of ZnO might be best exploited by constructing heterojunction with ZnO
active regions, in this way, the emission properties of an LED can still be determined by the
advantageous properties of ZnO. So far, many efforts have been devoted to developing ZnO-based p-n
heterojunction LEDs with ZnO as the n-type layer, combined with other p-type layers such as SrCu
2
O
2
,
*
This work was supported by the National Nature Science Foundation of China under the Grant No.50532080
(No.60576054), Nature Science Foundation of LiaoNing Province under the Grant No.20072178, Doctoral Project
by China Ministry of Education under the Grant No.20070141017, 2005 Excellence Youth Teacher Cultivation
Fund of Dalian University of Technology, and Jilin University Innovation Foundation.