Synthesis, structures and optical properties of CdS:Cd/Si multi-interface
nanoheterojunction
Yue Li Song
a
, He Ying Bian
a
, Yong Li
a,b,
⇑
, Peng Fei Ji
a
, Shu Qing Yuan
a
, Feng Qun Zhou
a
, Xin Jian Li
b
a
Department of Physics and Solar Energy Research Center, Pingdingshan University, Pingdingshan 467000, PR China
b
Department of Physics and Laboratory of Materials Physics, Zhengzhou University, Zhengzhou 450052, PR China
article info
Article history:
Received 17 December 2014
Received in revised form 25 February 2015
Accepted 26 February 2015
Available online 4 March 2015
Keywords:
Silicon nanoporous pillar array (Si-NPA)
CdS:Cd/Si multi-interface
nanoheterojunction (CdS:Cd/Si-NPA)
Tauc’s relation
Photoluminescence
abstract
CdS/Si multi-interface nanoheterojunction is synthesized through depositing nanocrystals CdS (nc-CdS)
on the silicon nanoporous pillar array (Si-NPA) using a chemical bath deposition method. p-type
nanocrystals Si in Si-NPA and n-type nc-CdS construct the multi-interface nanoheterojunction. Due to
the reducibility of Si-NPA, a portion of Cd
2+
in the interface of Si-NPA and solution are deoxidized and
nanocrystals Cd are simultaneously incorporated into the interface of Si–CdS, namely, CdS:Cd/Si-NPA.
Through decomposing the resolution XPS spectrum of Cd 3d, the ratio of Cd
0
and Cd
2+
is about 0.7:1.
Three primary color emissions from CdS:Cd/Si-NPA are observed at the room temperature. Optical band
gap obtained by the Tauc’s relation and origins of emission bands are studied.
Ó 2015 Elsevier B.V. All rights reserved.
1. Introduction
Heterojunction (or Schottky junction) is the base of electronic
and optoelectronic devices, the investigation of which is carried
out to explore and control the transportation of electrons and
holes. For example, Huang et al. have studied the transportation
of carriers by introduction an intermediate layer into the interface
of heterojunction and controlled the electron blocking and holes
transportation [1,2]. Shao et al. have controlled the carriers trans-
portation through the polarity of the applied voltage [3]. CdS, a
direct wide band gap of 2.42 eV, is an excellent material in the
optoelectronic applications, such as solar cells, field emission, pho-
todetectors and lasers [4–6]. As is known, the crystal Si has been a
dominant electronic material, and the nanoheterojunction based
on Si might be of key importance in the future optoelectronic
nanodevices. Silicon nanoporous pillar array (Si-NPA) is a
Si-based hierarchical structure characterized by a regular array of
micro-sized, quasi-identical and highly porous Si pillars con-
structed by silicon oxide encapsulated nanocrystal Si [7]. Based
on Si-NPA, CdS/Si nanoheterostructure have been fabricated, more-
over, the rectification effect and obvious photovoltaic properties
have been observed in this structure [8,9], which illustrate that
CdS/Si nanoheterostructure might be a novel heterostructure
photovoltaic devices. The higher open circuit voltage has been
obtain in the photovoltaic device based on CdS/Si nanoheterostruc-
ture, however, the short circuit current and energy conversion effi-
ciency are relatively low [9]. Through the analysis, the reason for
the lower short circuit current and energy conversion efficiency
is the higher series resistance. The adopted initial silicon wafers
are heavily boron-doped ones, the series resistance should mainly
originate from CdS thin films [10]. The introduction of foreign atom
is a usually method to reduce the resistance of nanostructure
semiconductor.
In this article, a CdS/Si multi-interface nanoheterojunction is
fabricated by depositing CdS nanocrystal (nc-CdS) on Si-NPA using
the chemical bath deposition (CBD) method. Utilizing the
reducibility of Si-NPA, Cd
2+
are deoxidized and nanocrystal Cd
(nc-Cd) are simultaneously incorporated into the interface of Si–
CdS, namely, CdS:Cd/Si-NPA. The structures and optical properties
of CdS:Cd/Si-NPA are studied in detail.
2. Experiments
The Si-NPA samples were prepared by hydrothermally etching p-type, (1 11)-
oriented single crystal silicon (sc-Si) wafers in the aqueous solution of hydrofluoric
acid containing ferric nitrate. The details about the preparing conditions and pro-
cesses have been reported previously [11]. The CdS thin films were grown on Si-
NPA by a CBD method. Firstly, 0.685 g cadmium chloride (CdCl
2
5
2
H
2
O) was dis-
solved in the mixture solution of 15 ml 25–28% ammonia (NH
3
H
2
O) and 65 ml
de-ionized water. Then the solution was poured into a bath and stirred with a mag-
netic agitation. The bath was kept at 80 °C for 60 min. Next, 5 ml 0.1 mol/l ammo-
nium chloride (NH
4
Cl) and 5 ml 2.0 mol/l thiourea (CH
4
N
2
S) were slowly added into
http://dx.doi.org/10.1016/j.jallcom.2015.02.199
0925-8388/Ó 2015 Elsevier B.V. All rights reserved.
⇑
Corresponding author at: Department of Physics and Solar Energy Research
Center, Pingdingshan University, Pingdingshan 467000, PR China.
E-mail address: liyong@pdsu.edu.cn (Y. Li).
Journal of Alloys and Compounds 637 (2015) 133–136
Contents lists available at ScienceDirect
Journal of Alloys and Compounds
journal homepage: www.elsevier.com/locate/jalcom