德国杜塞尔多夫大学ARCTURUS激光系统：高对比度、高功率多束激光研究

152 浏览量更新于2024-08-27 收藏 976KB PDF 举报

"ARCTURUS激光器：一种多功能、高对比度、高功率的多束激光系统。这款由德国杜塞尔多夫大学研发的激光系统采用双啁啾脉冲放大(CPA)架构，能够在两个高功率光束中分别产生7焦耳的能量。通过实施等离子体镜系统，其内在激光对比度得到了显著提升。" ARCTURUS激光系统是高功率激光科学和工程领域的一项重要发展，它体现了现代激光技术的先进水平。该系统的名称源自天文学中的Arcturus星，象征着其在激光领域的卓越性能和广泛适用性。其主要特点包括： 1. **双啁啾脉冲放大(CPA)架构**：这是一种关键的激光技术，用于将低能量的种子脉冲放大到极高能量水平，同时保持良好的光束质量。在ARCTURUS系统中，这种技术使得在压缩前每个高功率光束能够产生高达7焦耳的能量，这在许多应用中具有重要意义，如材料加工、粒子加速和高能物理实验。 2. **高对比度**：激光的对比度指的是其微弱前导脉冲与主脉冲之间强度的差异。对于某些高功率激光应用，如激光与物质相互作用的研究，高对比度至关重要，因为它可以减少非线性效应和背景噪声。ARCTURUS通过等离子体镜系统提升了激光的内在对比度，这有助于优化实验条件，提高实验结果的准确性。 3. **多束激光系统**：ARCTURUS设计成多束激光，这使得它可以同时进行多个独立的实验或在单次实验中使用多个激光束。这种能力对于并行处理、多点测量和复杂的激光诱导过程研究具有极大的价值。 4. **开放访问文章**：该论文是在《高功率激光科学与工程》期刊上发表的开放访问文章，这意味着公众可以免费获取和使用其中的信息，促进了科学研究的传播和合作。 5. **作者与机构**：ARCTURUS的研发团队由来自杜塞尔多夫大学和德累斯顿赫尔姆霍兹研究中心的科学家组成，这表明了跨机构合作在高技术研究中的重要性。 6. **应用领域**：由于其高功率和高对比度特性，ARCTURUS激光系统可能被应用于各种领域，包括但不限于激光切割、焊接、微加工、核聚变研究、天体物理学模拟以及医学领域的激光手术。 ARCTURUS激光系统以其创新的设计和高性能指标，展示了在高功率激光领域的潜力，为科研和工业应用提供了新的工具。通过不断的科技进步，我们可以期待未来激光技术将带来更多的突破和应用。

ARCTURUS laser system 3

the laser system, the contrast is controlled by saturable

absorbers, Pockels cells and, recently, by an XPW module.

Most of temporal proﬁle quality of the output pulses is

deﬁned at this stage. The second contrast improvement is

achieved by a single plasma mirror system, which can be

inserted in each of the main beam paths after the compressor.

Before the XPW module implementation, the intrinsic

laser contrast was limited by the regenerative ampliﬁer to

∼3 × 10

−7

at 12 ns (the regen roundtrip) and it could be

improved up to 6×10

−8

when a saturable absorber (SA) was

inserted after the regenerative cavity. For the conﬁguration

when the SAs were present in both the regen and booster

ampliﬁers, the contrast on a 400 ps time scale before the

pulse peak was measured with a SEQUOIA third-order

auto-correlator; the recorded temporal proﬁle is shown in

Figure 2(a) as the green trace. On the time axis, negative

values correspond to the time interval prior to the peak of

the main laser pulse. For comparison, the blue trace shows

the temporal proﬁle obtained in a conﬁguration when the SA

from the booster ampliﬁer was bypassed.

2.2. Cross-polarized wave ﬁlter

The XPW module is based on the third-order nonlinear

effect of cross-polarized wave generation (XPW) in a BaF

crystal

[24]

. In the module, the compressed pulse with an

energy of about 1 mJ is focused with a high-F-number lens

through a hollow ﬁber for spatial ﬁltering onto the XPW-

crystal placed in an evacuated tube. From the incoming

linearly polarized wave, a wave of the same frequency,

but with a perpendicular polarization, is created. Hereby,

the intensity of the cross-polarized wave is proportional to

the third power of the input intensity and, thus, the pulse

pedestal can be drastically reduced. One should note that the

XPW module is placed between a pair of polarizers and the

temporal contrast performance is limited by the extinction

ratio of the polarizing elements. With the XPW module, the

contrast ratio in the case of our laser system is improved by

three orders of magnitude, with an efﬁciency of about 10%,

and the pulse spectrum is broadened by a factor ∼1.7 to

about 60 nm

[20]

The contribution of the XPW module to the beam temporal

proﬁle was studied. In the double-CPA architecture, the laser

pulse was ﬁrstly temporally characterized by bypassing the

XPW module and removing the SA after regen 2, in the so-

called low-contrast conﬁguration (red trace in Figure 2(b)).

In this case, the ASE contrast was better than 10

−9

at 100 ps

and around 10

−8

at 10 ps, while at 1 ps before the laser pulse

maximum, the contrast was 10

−4

. After the ﬁrst CPA unit,

the beam was guided through the XPW module and the ASE

contrast for hundreds of picoseconds before the peak was

improved by three orders of magnitude to 10

−12

(blue trace).

For this measurement, in the time interval between −75 and

−15 ps, the efﬁciency of the pedestal cleaning decreases,

Figure 2. SEQUOIA measurements of the ARCTURUS laser system

showing the effect of different optical elements on the contrast

improvement. The traces in (a) show the effect of the SA in the booster

ampliﬁer in a single-CPA conﬁguration. In (b), a series of measurements

indicates the inﬂuence of the XPW module and the effect of the regen 2 SA

on the contrast enhancement in the double-CPA conﬁguration. The traces

in (c) show the present contrast quality for all three beams: both HP pulses

(beam 1 and beam 2) and the probe beam.

resulting in a drop in contrast from 10

−12

to 10

−8

. By

additionally inserting the SA after the regen 2, the temporal

proﬁle improves to 10

−12

at about 40 ps before the main

pulse, while the rising edge of the pulse ramps up by ﬁve

剩余10页未读，继续阅读

weixin_38618784

粉丝: 11
资源: 884

德国杜塞尔多夫大学ARCTURUS激光系统：高对比度、高功率多束激光研究

Habbo 独立成像仪_python_代码_下载

Arcturus UC5272用户手册英文版

Arcturus JavaEditor-开源

arcturus.github.io：关于Arcturus的全部。 #SavingGoogle

asteroids-cocoonjs:经典游戏

cursos-traduzidos：阿尔古斯cursos que envolvem tecnologia traduzidos por mim doinglêspara oportuguês（巴西）

IQ急转弯 IQ.Brainteasers-Norman.Sullivan

市场调研-中国mRNA疫苗平台市场现状及未来发展趋势.doc

spectroscopy:用于绘制和处理恒星光谱的 Python 脚本

2025年软考高级 - 信息系统项目管理师考试备考全攻略

最新资源