制作线性区域光栅的深度分级WSi2/Si多层膜减薄与抛光研究

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"这篇论文详细介绍了利用深度分级的WSi2/Si多层结构制作线性区域光栅（MLL）的过程，以及后续对多层样品进行切割和减薄的技术。这种多层劳埃透镜在聚焦X射线束到纳米尺度上具有高效率，展现了其在纳米光学领域的潜力。" 在光学领域，线性区域光栅是一种重要的光学元件，它通过利用衍射原理将入射光束转换成一系列聚焦点，从而实现对光束的精细控制。这篇论文的标题"Thinning and polishing of cross-section of depth-graded WSi2/Si multilayer for linear zone plate application"揭示了研究的核心——对深度分级的WSi2/Si多层结构进行减薄和抛光，以优化其在制作线性区域光栅（MLL）中的性能。论文描述了一个具体的实验过程，首先制备了一个由324层交替的WSi2和Si组成的深度分级多层结构，总厚度为7.9微米。这样的设计是根据区域光栅的规律来确定各层的厚度，确保光栅能有效地聚焦X射线。随后，多层样品被切割并进一步减薄，这是为了暴露内部的层状结构，以便进行观察和分析，同时优化光栅的光学性能。 WSi2和Si材料的选择是因为它们具有不同的X射线反射性质，可以形成所需的深度分级结构。WSi2通常具有较高的X射线吸收率，而Si则相对较低，这样的组合使得多层结构能够高效地反射和聚焦X射线。论文的标签表明这是一篇学术论文，可能包含了详细的实验方法、数据分析和结果讨论。在"CHINESE OPTICS LETTERS"期刊的2012年1月刊中发表，这通常意味着该研究经过了同行评审，具有一定的科学严谨性和可靠性。作者团队来自中国 Tongji 大学精密光学工程研究所和特殊人工微结构材料与技术上海重点实验室，以及中国工程物理研究院激光聚变研究中心，这表明了研究涉及跨学科的合作，并且是在专业机构的支持下进行的。文章的接收日期和接受日期表明了研究的周期，而在线发布日期则提示了研究成果的及时分享。对应作者的联系方式提供了一个直接获取更多信息的途径。这篇论文详细探讨了如何利用先进的材料和工艺制造高效的线性区域光栅，这对于纳米光学和X射线成像技术的发展具有重要意义。通过深度分级的WSi2/Si多层结构，研究者们展示了在纳米尺度上聚焦X射线的可能性，为未来高精度的光学应用提供了新的解决方案。

COL 10(1), 013103(2012) CHINESE OPTICS LETTERS January 10, 2012

Thinning and polishing of cross-section of depth-graded

WSi

/Si multilayer for linear zone plate application

Qiushi Huang (黄黄黄秋秋秋实实实)

1, 2

, Jingtao Zhu (朱朱朱京京京涛涛涛)

1, 2∗

, Haochuan Li (李李李浩浩浩川川川)

1, 2

, Zhengxiang Shen (沈沈沈正正正祥祥祥)

1, 2

Xiaoqiang Wang (王王王晓晓晓强强强)

1, 2

, Zhanshan Wang (王王王占占占山山山)

1, 2

, and Yongjian Tang (唐唐唐永永永建建建)

Institute of Precision Optical Engineering, Physics Department, Tongji University, Shanghai 200092, China

Shanghai Key Lab oratory of Special Artif icial Microstructure Materials and Technology, Tongji University,

Shanghai 200092, China

Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China

∗

Corresp onding author: jtzhu@tong ji.edu.cn

Received April 11, 2011; accepted June 14, 2011; posted online August 24, 2011

A linear zone plate named multilayer laue lens (MLL) is fabricated using a depth-graded multilayer struc-

ture. The lens shows considerable potential in focusing an X-ray beam into a nanometer scale with high

efficiency. In this letter, a depth-graded multilayer consisting of 324 alternating WSi

and Si layers with

a total thickness of 7.9 µm is deposited based on the thickness sequence according to the demands of

the zone plate law. Subsequently, the multilayer sample is sliced and thinned to an ideal depth along

the cross-section direction using raw abrasives and diamond lapping. Finally, the cross-section is polished

by a chemical mechanical polishing (CMP) technique to remove the damages and improve the surface

smoothness. The final depth of the MLL is approximately 7 µm with an achieved aspect ratio greater

than 400. Results of scanning electron microscopy (SEM) and atomic force microscopy (AFM) indicate

that interfaces are sharp, and the multilayer structure remains undamaged after the thinning and polishing

processes. The surface roughness achieved is 0.33 nm.

OCIS co des: 310.3840, 340.7460, 310.1860.

doi: 10.3788/COL201210.013103.

High-brilliance synchrotron X-ray sources enhance the

feasibility of nanobeam focusing, which is helpful to X-

ray microscopy analysis under higher resolution. Several

components have been developed to focus X-rays into

a nanobeam, such as Kirkpatrick-Baez mirrors

[1]

, com-

pound refractive lens

[2]

, Fresnel zone plate lens

[3]

, and

graded multilayer mirrors

[4]

. Fresnel zone plates have

been demonstrated as powerful focusing lenses in X-ray

microscopy applications. However, for hard X-rays, the

aspect ratio of a zone plate (ratio of the depth of a zone

plate to its outermost zone width) becomes exceedingly

large that could not be achieved using traditional litho-

graphic techniques. A novel linear zone plate, named

multilayer laue lens (MLL), is developed by depositing

the depth-graded multilayer reversely on ﬂat substrates

and subsequently slicing and polishing the lens to achieve

a larger aspect ratio. As a result, MLL has shown capa-

bility to provide a significantly higher focusing efficiency

and resolution especially in hard X-ray regions

[5,6]

. Fur-

thermore, the outermost layers (i.e., the thinnest layers)

of MLL, which determine the resolution, are ﬁrstly de-

posited on a substrate to control the thicknesses and

quality of the critical layers better. A MLL structure

with an outermost layer thickness of 5 nm has focused

the 19.5-keV X-ray into a line focus of 16 nm, with an

efficiency of 31%

[7]

In this letter, a MLL is designed and a thickness-graded

multilayer with 324 layers is successfully dep osited using

WSi

and Si alternately. The detailed slicing, thinning,

and polishing processes of the multilayer sample are re-

ported to form a nearly perfect linear zone plate with a

high aspect ratio.

The MLL was designed at energy E=8 keV, with a

focal length of 2.04 mm. According to the zone plate

law, the depth-graded multilayer should consist of 324

alternating WSi

and Si layers with a total thickness

of 7.9 µm. The outermost layer thickness of the zone

plate is 15 nm. In the present study, the layer thickness

increases from 15 to 65 nm as shown in Fig. 1.

The material combination of WSi

/Si was chosen to

fabricate the MLL because of its stable stress property

[8]

To ensure better control of the position and quality of the

outermost layers, which determine the focusing property,

the multilayer was deposited reversely on a super pol-

ished Si(100) substrate using direct current magnetron

sputtering technology

[9,10]

. After deposition, the cross-

section of the multilayer was observed by scanning elec-

tron microscopy (SEM), as shown in Fig. 2. Figure

2(a) is an image of the entire cross-section, and Fig. 2(b)

Fig. 1. Designed and deposited multilayer structure of MLL.

The total number of layers is 324 with a total thickness of 7.9

µm.

1671-7694/2012/013103(4) 013103-1

° 2012 Chinese Optics Letters

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