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首页连续相位滤镜优化高NA固体浸没透镜系统光场分布
连续相位滤镜优化高NA固体浸没透镜系统光场分布
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更新于2024-08-27
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本文主要探讨了在高数值孔径(NA)的固体浸没透镜(SIL)显微系统中,如何通过连续相位滤波器来优化光学场分布的问题。固体浸没透镜技术由Mansfield和Kino于1990年首次提出,其目的是突破光的衍射极限,从而实现更高的分辨率。然而,当SIL与样品界面处存在Fresnel效应时,会引入显著的像差,这可能导致图像质量下降。 文章的核心研究内容是设计并应用一种连续相位滤波器来改善SIL系统的性能。这种滤波器的作用在于通过调控光波前,有效地控制和校正因界面效应产生的光学失真。通过数值模拟的结果,作者展示了在连续相位滤波器的帮助下,SIL系统的光学场分布得到了显著优化。具体来说,焦点深度得以增强,透射光的强度也随之提升,这对于提高成像质量和细节分辨率至关重要。 尽管优化了主轴上的光分布,但侧边模的强度以及整体的分辨率保持得相当稳定,这意味着在增强核心性能的同时,并未牺牲系统的稳定性或信噪比。这些改进对于高NA SIL显微镜在诸如生物医学成像、纳米尺度检测等领域具有实际的应用价值,因为它能够提供更清晰、更精确的样本观察。 该研究成果为设计者提供了新的策略,即通过精密的光学元件设计来补偿SIL系统中的光学缺陷,从而推动了固态光学技术的发展,尤其是在超分辨成像领域。这项工作对光学工程师、材料科学家以及微纳技术领域的研究人员具有重要的参考价值。
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318 CHINESE OPTICS LETTERS / Vol. 5, No. 6 / June 10, 2007
Optimizing the optical field distribution of
solid immersion lens system by a continuous phase f ilter
Xuehua Ye (
), Yaoju Zhang (
), and Junfeng Chen (
ííí
)
College of Physics and Electronic Information, Wenzhou Universit y, Wenzhou 325027
Received November 30, 2006
In solid immersion lens (SIL) microscopy systems with high numerical aperture (NA), there always exists
the aberration produced by Fresnel effects at the interface between SIL and the sample. This aberration
may cause the degradation of the image of sample. We design a continuous phase filter and optimize
the optical field distribution of SIL system. The numerical results show that when the continu ous phase
filter is used, the field distribution of SIL system can be optimized, and the focal depth and intensity of
transmitted light can be increased. At the same time, the intensit y of side-lobe and the resolution are k ept
almost unchanged.
OCIS codes: 050.1970, 210.0210, 230.0230.
The technique of solid immersion lens (SIL), which can
overcome the diffraction limit, was first proposed by
Mansfield and Kino in 1990
[1]
. Since then, various ap-
plications of SILs have been developed, such as optical
storage
[2−4]
, scanning microscopy
[5]
, photolithography
[6]
,
the study of semiconductor structures
[7]
, and other
applications
[8−10]
. Amongthem,twotypesofSILsare
being widely developed, one is hemisphere SIL (h-SIL)
and the other is super-hemisphere SIL (s-SIL). To fur-
ther improve the resolution of SIL microscopy system,
the two-zone amplitude filters
[11,12]
or phase filters
[13,14]
have been used for high numerical aperture (NA) SIL sys-
tems. However, these amplitude filters may result in re-
duction of focal depth or Strehl ratio, which is a drawback
to their application. Although a discrete phase filter can
increase the focal depth of a SIL system in some extent,
the Strehl ratio still is not high enough and the side-lobe
intensity is large. Recently, we proposed a three-zone
amplitude filter and a phase filter
[15,16]
.Bothofthem
can increase the focal depth and improve the resolution of
SIL systems, but they still cannot avoid the energy loss.
In the near-field microscopy, the improvement of lateral
resolution is required, and the long focal depth and high
Strehl ratio are useful to many applications such as op-
tical storage and photolithography, especially in improv-
ing the collection efficiency of single-photon emitters
[10]
.
However, the aberration at the interface between SIL and
the sample may degrade the image of sample in the near
field. In order to corrent the aberration of SIL system,
Zhang has proposed a unique design of SIL system by
changing the radius or thickness
[17]
. In this letter, we in-
troduce a filter that has a continuously varying phase to
eliminate influence of aberration. This filter can increase
largely Strehl ratio and focal depth of the SIL systems,
and keep the side-lobe intensity and resolution almost
unchanged.
The schematic of the SIL system optimized by a contin-
uous phase filter is illuminated in Fig. 1. The thickness
of the SIL is h = R + A,whereA is the distance from
the plane surface to the center of the sphere and R is the
radius of the SIL. Supposing the SIL is surrounded by
air, the distance from Gaussian focus of the converging
lens to the center of the SIL is L (L + R<f
0
, f
0
is the
focal length of the converging lens). The phase filter is
placed closely in front of a converging lens L
1
with a high
NA and the SIL is on the right side of L
1
. The origin O
on the plane surface of the SIL is at the focus of the sys-
tem. Following the procedure of Helseth
[18]
and T¨or¨ok et
al.
[19]
, we obtain the transmitted field of a general SIL
system near the focus,
E =
θ
2max
0
dθ
2π
0
A(θ
1
,φ)exp(ik
3
z
3
cos θ
3
)
×exp[ik
2
ρ
c
sin θ
2
cos(φ − φ
c
)]exp(ik
0
ψ
G
)sinθ
2
dφ, (1)
where θ
2max
is the maximum effective converging angle
of light in the medium 2, k
i
(i =1, 2, 3) is the wave
number in the medium i, k
0
is the wave number in vac-
uum, ψ
G
is the geometric aberration function of the SIL,
and (ρ
c
,z
c
,φ
c
) are cylindrical coordinates centered at the
plane surface of the SIL. The relationship between the
maximum effective converging angle of the SIL and the
maximum converging angle α of the lens is given by
θ
2max
= α +arcsin
A
R
n
2
sin θ
2max
n
1
−arcsin
A
R
sin θ
2max
. (2)
Fig. 1. Schematic of the SIL system.
1671-7694/2007/060318-04
c
2007 Chinese Optics Letters
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