013102-1 CHINESE OPTICS LETTERS / Vol. 9, No. 1 / January 10, 2011
Comparison of laser-ind uced damage in Ta
2
O
5
and Nb
2
O
5
single-layer films and high reflectors
Cheng Xu (
NNN
§§§
)
1∗
, Yulong Zhao (
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999
)
1
, Yinghuai Qiang (
rrr
LLL
~~~
)
1
, Yabo Zhu (
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ÅÅÅ
)
1
,
Litong Guo (
HHH
ááá
ÖÖÖ
)
1
, and Jianda Shao (
ïïï
)
2
1
School of Materials Science and Engineering, China University of Mining and Technology, Xuzhou 221116, China
2
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
∗
Corresponding author: xucheng@siom.ac.cn
Received July 2, 2010; accepted August 20, 2010; posted online January 1, 2011
Ta
2
O
5
and Nb
2
O
5
films are deposited on BK7 glass substrates using an electron beam evaporation method
and are annealed at 673 K in the air. In this letter, comparative studies of the optical transmittance,
microstructure, chemical composition, optical absorption, and laser-induced damage threshold (LIDT) of
the two films are conducted. Findings indicate that the substoichiometric defect is very harmful to the
laser damage resistance of Ta
2
O
5
and Nb
2
O
5
films. The decrease of absorption improves the LIDT in films
deposited by the same material. However, although the absorption of the Ta
2
O
5
single layer is less than
that of the Nb
2
O
5
single layer, the LIDT of the former is lower than that of the latter. High-reflective
(HR) coatings have a higher LIDT than single layers due to the thermal dissipation of the SiO
2
layers and
the decreased electric field intensity (EFI). In addition, the Nb
2
O
5
HR coating achieves the highest LIDT
at 25.6 J/cm
2
in both single layers and HR coatings.
OCIS codes: 310.6860, 140.3330, 160.3380.
doi: 10.3788/COL201109.013102.
Ta
2
O
5
and Nb
2
O
5
have been widely investigated as
possible candidates for corrosion barrier coa tings, elec-
trochromic films, gas sensors, a nd catalysts. In optical
applications, Ta
2
O
5
and Nb
2
O
5
are used as wide trans-
parent spectra and high-refractive (HR) index materials
for optical waveguides, interference filters, anti-reflective
coatings, and electroluminescent devices
[1]
. Ta
2
O
5
and
Nb
2
O
5
films have especially been used as dielectric
coatings in high-power la ser applications. However,
both films easily become substoichiometric, resulting in
high absorption and low laser-induced damage threshold
(LIDT). This disadvantage restricts their applications
in high-power laser systems and makes them inferior to
HfO
2
, ZrO
2
, and other materials
[2]
. With the impr ove-
ment of post-annealing technology, the LIDT of Ta
2
O
5
and Nb
2
O
5
films can be increas e d, thus making them
popular materials for study.
Despite the numerous studies conducted on laser-
induced damage in films, comparing LIDT results re-
mains difficult becaus e test standards vary among differ-
ent research teams
[3,4]
. Moreover, comparative studies
about the LIDT of different materials a re rare
[5]
. We
believe a comparative study of Ta and Nb oxides will
be useful in understanding the laser damage resistance
of materials because both are the group V metals. Al-
though simple studies have been conducted on these
two materials, the effects of some important parameters
such as absorption on the LIDT are not discussed
[6]
.
Therefore, synthetic rese arch about the properties of the
two materials, including LIDT, will be meaningful and
valuable. In this letter, we prepare Ta
2
O
5
and Nb
2
O
5
films including single-layer films (only Ta
2
O
5
or Nb
2
O
5
)
and HR coatings (Ta
2
O
5
/SiO
2
or Nb
2
O
5
/SiO
2
). The
films are deposited using the electron beam evaporation
method, and are annealed in the air. Comparisons of
the optical properties, microstructure, chemical compo-
sition, optical absorption, and LIDT are made between
the two materials, as well as between single layers and
HR coatings. The damage mechanisms are als o discussed
in detail.
All films were dep osited on BK7 glass substrates by
electron beam eva poration. The base pres sure was
2×10
−3
Pa, the oxygen partial pressure was 2×10
−2
Pa,
and the substrate temperature was kept at 573 K during
the deposition. Both Ta
2
O
5
and Nb
2
O
5
single layers
were deposited with an optical thickness of 6 quarter
wavelength optical thickness (QWOT) at a wavelength
of 55 0 nm. For the HR coatings, Ta
2
O
5
/Nb
2
O
5
and
SiO
2
were use d as high and low refra c tive-index mate-
rials, respectively. The coating design of the HR struc-
ture was (HL)
x
H, where H stands for the QWOT of
Ta
2
O
5
/Nb
2
O
5
and L stands for the QWOT of SiO
2
(the
referent wavelength λ is 1064 nm). Annealing of the films
was performed in the air at 673 K for 12 h.
Transmittance spectra of the films were measured us-
ing a Lambda 9 00 spectrophotometer. T he measurement
error was under 0.08%. Refractive indics and film thick-
ness were obtained by Essential Macle od (a thin film
design software). The structure of the films was ana-
lyzed using an X-r ay diffractometer (XRD). The compo-
sition of the films was analyzed by X-ray photoelectron
sp e ctroscopy (XPS) using focused (300 µm in diameter)
monochromatic Al-Kα (hυ=1486.6 eV) radiation at a
pass energ y of 20 eV. Theoretical results of the electric
field intensity (EFI) distributions o f the films were cal-
culated by a thin film design software (TFCalc). Optical
absorption of the samples was measured by the surface
thermal lensing (STL) method
[7]
. Damage testing was
performed in the “1-on-1” regime ac cording to ISO stan-
dard 11254-1, using a 1064-nm Q- switch pulsed laser
at a pulse length of 12 ns
[8]
. The damage mor pholo-
gies of the samples were observed using a Leica DMRXE
1671-7694/2011/013102(4)
c
2011 Chinese Optics Letters