Contents
Preface to the Third Edition ........................................................................... ix
Preface to the Second Edition....................................................................... xi
Preface............................................................................................................... xiii
Chapter 1 Overview of Lithography................................................................ 1
Problems........................................................................................................................... 6
Chapter 2 Optical Pattern Formation .............................................................. 7
2.1 The Problem of Imaging................................................................................ 7
2.2 Aerial Images .................................................................................................... 9
2.3 The Contributions of Physics and Chemistry ......................................... 22
2.4 Focus .................................................................................................................... 32
Problems........................................................................................................................... 46
References ....................................................................................................................... 47
Chapter 3 Photoresists ................................................................................... 51
3.1 Positive and Negative Resists....................................................................... 51
3.2 Adhesion Promotion ....................................................................................... 54
3.3 Resist Spin Coating, Softbake, and Hardbake........................................ 57
3.4 Photochemistry of Novolak/DNQ g- and i-line Resists...................... 68
3.5 Acid-Catalyzed DUV Resists ...................................................................... 70
3.6 Development and Post-Exposure Bakes................................................... 76
3.7 Operational Characterization ....................................................................... 81
3.8 Line-Edge Roughness..................................................................................... 82
3.9 Multilayer Resist Processes.......................................................................... 92
Problems........................................................................................................................... 95
References ....................................................................................................................... 96
Chapter 4 Modeling and Thin-Film Effects ..................................................... 109
4.1 Models of Optical Imaging........................................................................... 109
v
Downloaded From: http://ebooks.spiedigitallibrary.org/ on 02/07/2014 Terms of Use: http://spiedl.org/terms
我的内容管理
收起
我的收益 登录查看自己的收益
我的积分
登录查看自己的积分
我的C币
登录后查看C币余额
我的收藏 
我的下载 
下载帮助 
评论4