
第 42 卷 第 7 期
2015 年 7 月
Vol. 42, No. 7
July, 2015
中 国 激 光
CHINESE JOURNAL OF LASERS
0708006-
一种降低平面子孔径拼接累积误差的方法
李 永
1,2
唐 锋
1
卢云君
1
王向朝
1,2
郭福东
1
李 杰
1,2
吴飞斌
1,2
1
中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
2
中国科学院大学, 北京 100049
摘要 干涉仪参考镜面形离焦误差难以精确标定,是导致拼接累积效应、制约平面子孔径拼接系统检测精度的主要
因素 。推导了参 考镜离焦与 拼接累积误 差、拼接 次数间的定 量表达式,基于该表 达式在拼接 过程中标定 并去除参
考镜离焦误差,降低拼接累积误差。对 450 mm×60 mm 的平面镜进行了 8 个子孔径的拼接检测,与大口径干涉仪检
测结果比对,去除参考面离焦误差前后拼接测量误差峰谷(PV)值从λ/10 减小至λ/30,有效提高了拼接测量精度。结
合绝 对检验技术 标定参考镜 高阶面形误 差,验证 了离焦是引 起拼接误差 累积的主要 因素,消 除参考镜高 阶面形误
差并不能显著提高拼接检测精度。
关键词 测量; 子孔径拼接干涉测量; 误差累积; 离焦; 绝对检验
中图分类号 O436.1 文献标识码 A
doi: 10.3788/CJL201542.0708006
A Method for Reducing the Error Accumulation in Sub-Aperture
Stitching Interferometer for Flat Optics
Li Yong
1,2
Tang Feng
1
Lu Yunjun
1
Wang Xiangzhao
1,2
Guo Fudong
1
Li Jie
1,2
Wu Feibin
1,2
1
Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and
Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2
University of Chinese Academy of Sciences, Beijing 100049, China
Abstract The power of reference flat (RF) in interferometer is difficult to be calibrated accurately. It leads to
stitching error accumulation effect in sub-aperture stitching interferometer for flat optics, and becomes the major
restriction factor for improving stitching accuracy. A quantitative equation is deduced for calculating the power
of RF from stitching accumulation error and stitching numbers. Then the power of RF is calibrated and removed
in the process of stitching. The error Accumulation is reduced. A flat mirror with aperture of 450 mm ×60 mm is
tested by 8 sub- apertures. Compared with the test result of a large aperture interferometer, the stitching
measurement error is reduced from λ/10 peak-valley value to λ/30 PV with power compensation. The stitching test
accuracy is improved effectively. Using absolute flatness test, the high order surface figure of the RF is also
calibrated. It is verified that the power is the main source of the error accumulation in stitching. Removing the high
order surface figure of the RF cannot improve the stitching accuracy significantly.
Key words measurement; sub-aperture stitching interferometry; error accumulation; power; absolute test
OCIS codes 120.3180; 120.6650; 120.6660
收稿日期: 2015-02-09; 收到修改稿日期: 2015-03-19
基金项目: 国家自然科学基金(61205102,61275207,61405210,61474129)、上海市自然科学基金项目(14ZR1444900)
作者简介: 李 永(1988—),男,硕士研究生,主要从事子孔径拼接干涉测量技术方面的研究。E-mail: nmber5@163.com
导师简介: 唐 锋(1979—),男,副研究员,硕士生导师,主要从事信息光电子技术方面的研究。
E-mail: tangfeng@siom.ac.cn(通信联系人)
1 引 言
随着现 代光学 的发展,大口径 光学平 面元件在极大规模集成电 路制造 、天文望远镜和 惯性约 束聚变 等
系统中得到了广泛的应用,他们对大口径光学元件的面形加工精度提 出了很 高要求 ,如高端投 影光刻 机工
1