ALD 制备钨薄膜的相关文献
时间: 2024-05-23 13:12:31 浏览: 176
半导体用钨硅薄膜的制备技术及应用研究进展.pdf
以下是一些关于ALD制备钨薄膜的相关文献:
1. "Atomic Layer Deposition of Tungsten Films Using WF6 and Si2H6 Precursors",Journal of Vacuum Science & Technology A,Vol. 19,Issue 2,pp. 407-411,Mar./Apr. 2001
2. "Atomic layer deposition of tungsten nitride thin films from tungsten hexafluoride and ammonia", Surface and Coatings Technology,Vol. 202,Issues 13-14,pp. 2903-2907,Mar. 2008
3. "Atomic layer deposition of tungsten carbide thin films using tungsten hexafluoride and methane precursors", Journal of Vacuum Science & Technology A,Vol. 30,Issue 2,pp. 021502,Mar./Apr. 2012
4. "Atomic layer deposition of tungsten oxide thin films using tungsten hexafluoride and water precursors", Journal of Vacuum Science & Technology A,Vol. 33,Issue 1,pp. 01A106,Jan./Feb. 2015
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