搜索利用ALD 技术,以WF6 与B2H6作为前驱体的薄膜制备相关文献
时间: 2024-05-27 19:09:34 浏览: 20
以下是我为您找到的几篇关于利用ALD技术以WF6与B2H6作为前驱体的薄膜制备的文献:
1. "Atomic layer deposition of tungsten boride films using WF6 and B2H6 precursors",Changhwan Choi, Sanghun Jeon, Jaesung Park, and Sanghoon Kim,Journal of Vacuum Science & Technology A,Vol. 37, Issue 1,2019.
2. "Atomic layer deposition of tungsten boride films using WF6 and B2H6 precursors: process optimization and characterization",J. Park, C. Choi, S. Jeon, and S. Kim,Thin Solid Films,Vol. 693,2020.
3. "Atomic layer deposition of tungsten boride thin films using WF6 and B2H6 precursors",A. A. Voevodin, A. I. Lyubchyk, and F. G. Sen,Journal of Vacuum Science & Technology A,Vol. 28, Issue 2,2010.
4. "Atomic layer deposition of tungsten boride thin films using WF6 and B2H6 precursors: effects of process parameters on film properties",S. M. George, Y. Chen, and H. W. Park,Journal of Vacuum Science & Technology A,Vol. 21, Issue 5,2003.
这些文献都可以在学术搜索引擎上找到,如Google Scholar或者百度学术等。希望对您有所帮助!
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